Everspin Technologies, Inc. has entered into an agreement with Plasma-Therm, allowing Everspin to use the 8-inch Pinnacle Ion Beam Etch System for advanced STT-MRAM materials and etch development in conjunction with their Chandler 8-inch facility.
Everspin’s V.P of Technology R&D, Dr. Sanjeev Aggarwal, stated, “We have added the capability of ion beam etch processing by integrating the Pinnacle IBE tool with our in-house MRAM manufacturing capabilities for time and cost effective STT-MRAM development. The Pinnacle tool shows excellent results in our work together so far. This capability complements well the work being done with our 12-inch development and manufacturing partners.”
Abdul Lateef, Plasma-Therm’s CEO, said, “The joint development work we are doing with Everspin reinforces our guiding philosophy that to be a truly global leader of technology we must innovate in partnership with our customers. Everspin’s technology is advancing the capability of memory and we are proud to be associated with them.”